Vol. 50, Issue 2, pp. 271-280

Vol. 50 Issue 2 pp. 271-280

Generation of three-port splitter by double-layer grating in second-order Littrow configuration

Chenhao Gao, Bo Wang, Chen Fu, Jimin Fang, Kunhua Wen, Ziming Meng, Zhaogang Nie, Xiangjun Xing, Li Chen, Liang Lei, Jinyun Zhou

Keywords

three-port splitter, second-order Littrow, double-layer grating

Abstract

In this paper, a novel double-layer three-port grating is described. The incident grating structure is in the second-order Littrow configuration. The grating region is composed of fused silica and Ta2O5. The designed grating beam splitter has high efficiency under TE polarization and TM polarization, respectively. The efficiency of two polarizations is more than 90%. In addition, compared with a single-layer three-port grating, this new beam splitter has good fabrication tolerance and incident bandwidth. Therefore, the optimized structure has a good application value.

Vol. 50
Issue 2
Article No: 10
pp. 271-280

1.05 MB
OPTICA APPLICATA - a quarterly of the Wrocław University of Science and Technology, Faculty of Fundamental Problems of Technology