Vol. 33, Issue 4, pp. 669-676

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  2. Optica Applicata Vol. 33, Issue 4, pp. 669-676 (2003)
Vol. 33 Issue 4 pp. 669-676

Thermal characterization of micro-devices with far and near field microscopy

Roman F. Szeloch, Teodor P. Gotszalk, Pawel Janus

Keywords

scanning thermal microscopy, thermal characterization, AFM

Abstract

After a brief survey of several applications of scanning thermal microscopy (SThM) developed for high resolution thermal diagnostics we present results of thermal analysis of two types of MEMS. Firstly, we have applied our far field thermographic system for analysis of thermal behaviour of the silicon cantilever fabricated as a sensor for a femtocalorimeter near field system. The next results are linked with application of SThM system with the Wollaston probe in micro-thermal measurements of atomic force microscopy (AFM) cantilever.

Vol. 33
Issue 4
pp. 669-676

1.36 MB
OPTICA APPLICATA - a quarterly of the Wrocław University of Science and Technology, Faculty of Fundamental Problems of Technology