Vol. 39, Issue 4, pp. 711-716

Vol. 39 Issue 4 pp. 711-716

Application of nanoscratching in electronic devices

Maria Ramiaczek-Krasowska, Adam Szyszka, Joanna Prazmowska, Regina Paszkiewicz, Marek Tlaczala

Keywords

nanolithography, nanoscratching, AFM lithography

Abstract

The lithography is a basic operation in the fabrication process of semiconductor devices.  The scaling ability is the reason why the atomic force microscopy (AFM) nanolithograpy is currently studied in many laboratories. In the paper, the results of the mechanical AFM lithography, named nanoscribing or nanoscratching, are presented. In this method, the pattern is created by mechanical interaction between the AFM tip and a sample. This interaction requires the application of large forces in micronewtons scale.

Vol. 39
Issue 4
pp. 711-716

1.42 MB
OPTICA APPLICATA - a quarterly of the Wrocław University of Science and Technology, Faculty of Fundamental Problems of Technology