Vol. 41, Issue 2, pp. 351-357

Abstract

Rib waveguides were fabricated with the use of selective, wet chemical etching of two-component waveguide films SiO₂:TiO₂ which were obtained using the sol–gel method. Photoresist was applied as a mask in the process. The etching of the layers SiO₂:TiO₂ was carried out in water solutions of ammonia fluoride. The paper presents the results of theoretical analysis as well as the power distributions in the obtained strip waveguides and directional couplers.