Vol. 41, Issue 2, pp. 441-447

Vol. 41 Issue 2 pp. 441-447

Analysis of chemical shifts in Auger electron spectra versus sputtering time from passivated surfaces

Alina Domanowska, Boguslawa Adamowicz, Piotr Bidzinski, Andrzej Klimasek, Janusz Szewczenko, Tomasz Gutt, Henryk Przewlocki

Keywords

Auger electron spectroscopy (AES), interfaces, passivation, evolutionary algorithms

Abstract

Chemical shifts in Auger electron spectra versus Ar+ ion sputtering time were analysed for various passivated interfaces, including SiO2(100 nm)/Si, SiO2(40 nm)/4H-SiC structures and native oxide/austenitic stainless steel 316LVM. On this basis, in-depth profiles of chemical composition were determined and the thickness of passivation nanofilms was estimated. Quantitative numerical analysis was performed by means of a developed computer procedure for both the AES spectrum background subtraction and peak decomposition with pseudo-Voigt functions using evolutionary algorithms.

Vol. 41
Issue 2
pp. 441-447

1.5 MB
OPTICA APPLICATA - a quarterly of the Wrocław University of Science and Technology, Faculty of Fundamental Problems of Technology