Vol. 34, Issue 3, pp. 319-329

Vol. 34 Issue 3 pp. 319-329

Femtosecond laser-induced damage in dielectrics

ufeng Peng, Yaoli Wei, Zhenlong Lv

Keywords

femtosecond laser, ablation mechanism, damage threshold, electron number density

Abstract

We present a new method to investigate the ablation phenomenon by a 100 fs, 1053 nm Gaussian laser pulse in fused silica and describe the different mechanisms of ablation in long pulse and ultrashort pulse lasers. A modified rate equation is used to numerically calculate damage in dielectrics. In addition, we examine the respective role of ionization and avalanche ionization in femtosecond laser-induced damage. We find that present results are in quantitative agreement with those of earlier study.

Vol. 34
Issue 3
pp. 319-329

0.45 MB
OPTICA APPLICATA - a quarterly of the Wrocław University of Science and Technology, Faculty of Fundamental Problems of Technology