Vol. 35, Issue 1, pp. 129-137 (2005)

Vol. 35 Issue 1 pp. 129-137

Optical beam injection methods as a tool for analysis of semiconductor structures

Jaroslaw DOMARADZKI, Danuta KACZMAREK

Keywords

transparent semiconducting oxide, heterojunction, p-i-n diode, optical beam, induced current

Abstract

Optical beam injection methods, such as an optical beam induced current (OBIC) one, have several advantages. Such methods enable a comprehensive analysis of photocurrent generated at the microregion of a semiconductor material or a device by focused light beam. In the paper, examples of applications of the OBIC method for : i) examination of the silicon p-i-n diodes used in a scanning electron microscope (SEM) as a detector and ii) localization of electrically active regions at the interface of the new transparent oxide semiconductor (TOS)–semiconductor structure have been outlined.

Vol. 35
Issue 1
pp. 129-137

0.38 MB

Corresponding address

Optica Applicata
Wrocław University of Science and Technology
Faculty of Fundamental Problems of Technology
Wybrzeże Wyspiańskiego 27
50-370 Wrocław, Poland

Publisher

Wrocław University of Science and Technology
Faculty of Fundamental Problems of Technology
Wybrzeże Wyspiańskiego 27
50-370 Wrocław, Poland

Contact us

  • optica.applicata@pwr.edu.pl
  • +48 71 320 23 93
  • +48 71 328 36 96