Vol. 37, Issue 1-2, pp. 83-92 (2007)

Vol. 37 Issue 1 pp. 83-92

Energy meter system for gas-puff laser plasma

Zbigniew Bielecki, Janusz Mikolajczyk

Keywords

EUV radiation, EUV energy meter, nanolithography

Abstract

The authors demonstrate a detection system of EUV radiation pulses. The system provides energy measurements with uncertainty of 7.3% in the range of wavelengths 13.5 ± 0.5 nm (FWHM = 7.3%). The calibration of the system was taken using the E-Mon commercial meter and a laser-plasma source. The procedures made it possible to determine a calibration factor for the laser-plasma source with helium-xenon gas puff target. The factor is exploited for the purpose of standardizing measurements of EUV radiation with FWHM = 2%. A substantial improvement in the system responsivity is demonstrated.

Vol. 37
Issue 1
pp. 83-92

0.84 MB

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Optica Applicata
Wrocław University of Science and Technology
Faculty of Fundamental Problems of Technology
Wybrzeże Wyspiańskiego 27
50-370 Wrocław, Poland

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Wrocław University of Science and Technology
Faculty of Fundamental Problems of Technology
Wybrzeże Wyspiańskiego 27
50-370 Wrocław, Poland

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