Vol. 37, Issue 4, pp. 335-340 (2007)

Abstract

This work presents the study of the structural and optical properties of TiO₂:Tb thin films deposited on Si (100) and SiO₂ substrates by magnetron sputtering from metallic Ti-Tb mosaic target. Thin films were studied by means of scanning electron microscopy with energy disperse spectrometer (SEM-EDS), atomic force microscopy (AFM), X-ray diffraction (XRD) and the optical transmission method. From SEM-EDS the total amount of Tb concentration was determined. XRD analysis revealed the existence of crystalline TiO₂ in the form of anatase and rutile, depending on Tb amount in the examined samples. The optical transmission method has shown that Tb doping shifts the fundamental absorption edge of TiO₂ toward the longer wavelength region.