Vol. 39, Issue 3, pp. 561-570 (2009)

Vol. 39 Issue 3 pp. 561-570

Photoreflectance study of partially relaxed epitaxial InGaAs on GaAs

Marcin Motyka, Lukasz Gelczuk, Maria Dabrowska-Szata,Jaroslaw Serafinczuk, Robert Kudrawiec, Jan Misiewicz

Keywords

III-V semiconductors, PR spectroscopy, X-ray diffraction, strain relaxation, gallium indium arsenide

Abstract

Room temperature photoreflectance (PR) spectroscopy and high resolution X-ray diffraction (HRXRD) have been used to investigate InxGa1–xAs layers grown compressively by MOVPE on GaAs substrates, with different composition and thickness. HRXRD reveals that all the samples are partially relaxed and In composition has been determined for each of the samples. The effects of residual strain on the optical response of the samples, namely interband transitions and the valence band splitting, were analyzed by fitting the standard line shape form to the PR data. The energies determined experimentally as a function of indium content were compared to those obtained in the framework of the elastic strain theory for pseudomorphic layers. This comparison allows us to estimate the extent of strain relaxation and to determine the residual strain values in the samples. Furthermore, we revealed that the measured residual strain εres follows t–1/2 dependence on the epitaxial layers thickness t. This confirms the appropriateness of the nonequilibrium models (energy-balance models) for these structures.

Vol. 39
Issue 3
pp. 561-570

0.75 MB

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Optica Applicata
Wrocław University of Science and Technology
Faculty of Fundamental Problems of Technology
Wybrzeże Wyspiańskiego 27
50-370 Wrocław, Poland

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Wrocław University of Science and Technology
Faculty of Fundamental Problems of Technology
Wybrzeże Wyspiańskiego 27
50-370 Wrocław, Poland

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