Vol. 56, Issue 1, pp. 5-17 (2026)

Vol. 56 Issue 1 pp. 5-17

Digital holographic microscopy aberration compensation based dual wavelength

Yong Kong, Ke Ke Liu, Yuzirui Zhang, Siyu Wei, Chao Wang, Xin Tang

Keywords

digital holography, aberration, filter, dual wavelength

Abstract

In the context of digital holographic microscopic quantitative phase imaging, a microscope is employed in the experimental setup to magnify both the object light and the reference light beam. The three-dimensional phase information within the hologram is influenced by the curvature of the microscope, resulting in significant distortion of the object phase. Additionally, off-axis tilting introduces further phase distortions. In this study, we propose a two-wavelength phase subtraction method to mitigate such distortions in digital holographic microscopy. The procedure involves capturing phase images at distinct wavelengths using filters that are highly transparent to the 671 nm band and highly reflective to the 532 nm band. By subtracting the phase image containing both object information and distortion from the phase image containing only distortion, a distortion-compensated phase image is obtained. Through both theoretical analysis and experimental validation, we demonstrate that the proposed method offers substantial potential for effectively compensating distortions in digital holographic microscopy.

Vol. 56
Issue 1
pp. 5-17

0.71 MB

Corresponding address

Optica Applicata
Wrocław University of Science and Technology
Faculty of Fundamental Problems of Technology
Wybrzeże Wyspiańskiego 27
50-370 Wrocław, Poland

Publisher

Wrocław University of Science and Technology
Faculty of Fundamental Problems of Technology
Wybrzeże Wyspiańskiego 27
50-370 Wrocław, Poland

Contact us

  • optica.applicata@pwr.edu.pl
  • +48 71 320 23 93
  • +48 71 328 36 96